JPH0648846Y2 - 薄膜デバイスの製造設備 - Google Patents
薄膜デバイスの製造設備Info
- Publication number
- JPH0648846Y2 JPH0648846Y2 JP1988108117U JP10811788U JPH0648846Y2 JP H0648846 Y2 JPH0648846 Y2 JP H0648846Y2 JP 1988108117 U JP1988108117 U JP 1988108117U JP 10811788 U JP10811788 U JP 10811788U JP H0648846 Y2 JPH0648846 Y2 JP H0648846Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- conveyor
- loop
- cleaning
- line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 title claims description 49
- 238000004519 manufacturing process Methods 0.000 title claims description 28
- 239000000758 substrate Substances 0.000 claims description 243
- 230000007246 mechanism Effects 0.000 claims description 84
- 239000010408 film Substances 0.000 claims description 68
- 238000004140 cleaning Methods 0.000 claims description 66
- 238000012546 transfer Methods 0.000 claims description 65
- 238000012545 processing Methods 0.000 claims description 58
- 238000005530 etching Methods 0.000 claims description 19
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 239000002184 metal Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 18
- 230000008569 process Effects 0.000 description 18
- 238000000151 deposition Methods 0.000 description 12
- 230000032258 transport Effects 0.000 description 12
- 238000001312 dry etching Methods 0.000 description 11
- 238000004544 sputter deposition Methods 0.000 description 11
- 238000001039 wet etching Methods 0.000 description 11
- 230000008021 deposition Effects 0.000 description 9
- 229910021417 amorphous silicon Inorganic materials 0.000 description 8
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 238000000059 patterning Methods 0.000 description 4
- 238000011161 development Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 239000000969 carrier Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000011176 pooling Methods 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Multi-Process Working Machines And Systems (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988108117U JPH0648846Y2 (ja) | 1988-08-17 | 1988-08-17 | 薄膜デバイスの製造設備 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988108117U JPH0648846Y2 (ja) | 1988-08-17 | 1988-08-17 | 薄膜デバイスの製造設備 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0229527U JPH0229527U (en]) | 1990-02-26 |
JPH0648846Y2 true JPH0648846Y2 (ja) | 1994-12-12 |
Family
ID=31343150
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1988108117U Expired - Lifetime JPH0648846Y2 (ja) | 1988-08-17 | 1988-08-17 | 薄膜デバイスの製造設備 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0648846Y2 (en]) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3654597B2 (ja) * | 1993-07-15 | 2005-06-02 | 株式会社ルネサステクノロジ | 製造システムおよび製造方法 |
TW200702962A (en) * | 2005-07-04 | 2007-01-16 | Murata Manufacturing Co | Processing system and processing method |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56169343A (en) * | 1980-05-30 | 1981-12-26 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS5733952A (en) * | 1980-08-11 | 1982-02-24 | Nissan Motor Co Ltd | Automatic conveyor of work |
JPS63105877A (ja) * | 1986-10-24 | 1988-05-11 | Hitachi Ltd | ワ−クの搬送装置 |
JPS63120061A (ja) * | 1986-11-07 | 1988-05-24 | Hitachi Ltd | 無人搬送車への作業割付制御方式 |
-
1988
- 1988-08-17 JP JP1988108117U patent/JPH0648846Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0229527U (en]) | 1990-02-26 |
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